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Dan M. Goebel's Picture
Address:
Jet Propulsion Laboratory
M/S 125-109
4800 Oak Grove Dr.
Pasadena, CA 91109
Phone:
818.354.8284
Fax:
818.393.6682
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Dan M. Goebel
Senior Research Scientist

Dan M. Goebel received a B.S. in physics, an M.S. in electrical engineering, and a Ph.D. in applied plasma physics from the University of California, Los Angeles, in 1977, 1978 and 1981 respectively. He is a Senior Research Scientist at Jet Propulsion Laboratory where he is responsible for the development of high efficiency electric thrusters, advanced long life components such as cathodes and grids, and thruster life model validation for deep space missions. Previously he was a Research Scientist at HRL Laboratories in Malibu, CA and Boeing EDD in Torrance, CA where he was the supervisor of the Advanced Technology Group for microwave tube development and the lead scientist of the XIPS ion thruster program for commercial satellite station keeping. Dr. Goebel is a Fellow of the AIAA, the IEEE, and the American Physical Society (APS) and a member of Sigma Xi. He is the author of over 120 technical papers, one book entitled Fundamentals of Electric Propulsion: Ion and Hall Thrusters published by J.Wiley and Sons in 2008, a dozen book chapters, and holds 41 patents.
Education
  • B.S. (Physics), University of California at Los Angeles, 1977
  • M.S. (Electrical Engineering), UCLA, 1978
  • Ph.D. (Applied Plasma Physics, Electrical Engineering Department), UCLA, 1981

Research Interests
Electric propulsion, high efficiency ion and Hall thrusters, cathodes, high voltage engineering, microwave devices and microwave communications, pulsed power.

Professional Experience
Employment
  • Jet Propulsion Laboratory; Senior Research Scientist 1/03-Present
  • University of Southern California; Adjunct Professor 12/99 – present
  • University of California, Los Angeles; Visiting Scholar, Lecturer 3/07 - present
  • HRL/Hughes/Boeing; Principal Scientist 9/88 – 12/02
  • Plasma & Materials Technology (listed on the NASDAQ); Co-founder and Research Director 1/86 - 6/92
  • University of California, Los Angeles; Research Staff, Principal Development Engineer 4/82 - 8/88
  • University of California, Los Angeles; Postdoctoral Scholar 3/81 - 4/82

Professional Society Memberships
  • Fellow of the Institute of Electrical and Electronics Engineers (IEEE)
  • Fellow of the American Institute of Aeronautics and Astronautics (AIAA)
  • Life Member of the American Physical Society (APS)
  • Full Member of the Sigma Xi Research Society

Journal Editorial Service
  • IEEE Transactions on Electron Devices, Associated Editor for Vacuum Devices (2000-2005)
Teaching
  • Adjunct Professor, University of Southern California, 2000-present
  • Visiting Scholar and Lecturer, University of California at Los Angeles, 2007-present

Selected Awards
  • Associated Western Universities Research Scholarship (1978)
  • IEEE Nuclear and Plasma Society National Graduate Student Award (1980)
  • Outstanding Ph.D. Candidate, UCLA School of Engineering and Applied Science (1981)
  • Hughes Electronics Achievement Awards (1990, 1992)
  • HRL Outstanding Published Paper Awards (1993, 1996)
  • Hughes Space and Communications Outstanding Patent Award (1997)
  • Hughes Electron Dynamics Outstanding Patent Award (1998)
  • Hughes Space and Communications Technical Achievement Award (2000)
  • Hughes Electronics Chairman’s Award (2000)
  • Boeing Satellite Systems President’s Honor Award (2001)
  • Boeing Technical Achievement Award (2002)
  • Boeing Technical Fellow (2002)
  • IEEE William Dunbar High Voltage Achievement Award (2004)
  • AIAA Best Paper Award, Joint Propulsion Conference Electric Propulsion (2005)
  • International Electric Propulsion Conference Best Paper Award (2009)
  • JPL Bonus Award and Team Awards (2005, 2006, 2007, 2009, 2010)
  • NASA Honors Award for Engineering Achievement (2011)
  • NASA Inventions and Contributions Board Award (2011)

Selected Publications
Patents
  1. High current density cathode structure U.S.#4,297,615 October 27, 1981
  2. Plasma apparatus for the application of materials U.S.#4,885,070 Dec. 5, 1989
  3. Hollow cathode plasma switch with magnetic field U.S.#5,132,597 July 21, 1992
  4. Ion implantation & processing method and apparatus U.S.#5,212,425 May 18, 1993
  5. Plasma source for ion implantation U.S.#5,218,179 June 8, 1993
  6. Method of implanting ions from a plasma in an object U.S.#5,296,272 March 22, 1994
  7. High-voltage crossed-field plasma switch U.S.#5,329,205 July 12, 1994
  8. High-speed plasma-closing switch U.S.#5,336,975 August 9, 1994
  9. High-impedance plasma ion implantation method U.S.#5,330,800 July 19, 1994
  10. High pulse-repetition-rate plasma-cathode E-gun U.S.#5,537,005 July 16, 1996
  11. High-impedance plasma ion implantation apparatus U.S.#5,607,509 March 4, 1997
  12. Plasma switch with current and fault interruption U.S.#5,608,297 March 4, 1997
  13. Apparatus for coating substrates U.S.#5,656,141 August 12, 1997
  14. Triggered plasma waveguide shutter U.S.#5,663,694 Sept. 2, 1997
  15. Plasma filled microwave amplifier and oscillator U.S.#5,668,442 Sept. 16, 1997
  16. Plasma assisted microwave source with B-field U.S.#5,694,005 Dec. 2, 1997
  17. Planar crossed-field plasma switch U.S.#5,828,176 October 27, 1998
  18. Low cost, compact, low frequency TWT U.S.#5,932,971 August, 3, 1999
  19. Optimally designed TWT for operation at back-off U.S.#5,942,852 August 24, 1999
  20. Efficient TWT collector with electrostatic lens U.S.#6,094,009 July 25, 2000
  21. Protection technique for communications TWTs U.S.#6,324.041 Nov. 27, 2001
  22. Precision micropropulsion ion thruster CIT-4915-P
  23. Hollow cathode plasma switch EP#506001 Sept. 30, 1992
  24. Apparatus for coating substrates EP#463230 Jan. 2, 1992
  25. Ion implantation apparatus EP#480688 April 15, 1992
  26. Surface ion implantation EP#480689 April 15, 1992
  27. Grid modulated 100 kV cross field plasma switch EP#574933 Dec. 22, 1993
  28. High impedance plasma implantation method EP#596496 April 27, 1994
  29. High current crossed field plasma switch EP#594087 April 27, 1994
  30. Triggered plasma microwave switch EP#0794588 Oct. 9, 1997
  31. Efficient, linear TWT for communications appl. EP#0883154 Dec. 9, 1998
  32. High efficiency collector for TWTs EP#0883151 Dec. 9, 1998
  33. Optimally designed TWT for operation at backoff EP#0883153 Dec. 9, 1998
  34. Circuit for production of communications TWTs EP#1094488 April 25, 2001
  35. Cathodic sputtering device DE#3830478 July 13, 1989
  36. Apparatus for thin film coating DE#4020158 Jan. 2, 1992
  37. Plasma source arrangement for ion implantation CP#2,052,080 Jan. 14, 1997
  38. Ion implant. and surf processing method & apparatus CP#2,052,543 Jan. 28, 1997
  39. High-impedance plasma ion implantation method CP#2,102,384 Jan. 11, 2000
  40. Cathode sputtering unit EP#308680 March 24, 2002
*U.S.=United States Patent EP=European Patent DE = German Patent CP=Canadian Patent

NASA New Technology Reports (NTRs)
  1. NTR # 43494, “Extremely high efficiency xenon ion thruster”
  2. NTR # 43495, “Method for doubling xenon ion thruster life”
  3. NTR # 43564, “Highly efficient hollow cathode for plasma and electric propulsion applications”
  4. NTR # 43574, “Rare-earth emitter hollow cathode for space propulsion applications”
  5. NTR # 44923. “Compact, High-Current Rare-Earth Cathode for Space Propulsion Applications”
  6. NTR # 44961, “Precision Micro-propulsion Ion Thruster”
  7. NTR# 46782, “Improved Rare-Earth Emitter Cathode for Space Propulsion Applications.”
  8. NTR # 47347, “Internal Electrostatic Discharge Monitor (IESDM)”

Books and Book Chapters
  1. D.M. Goebel and I. Katz, Fundamentals of Electric Propulsion Ion and Hall Thrusters, John Wiley & Sons, NY (2008).
  2. D.M. Goebel, co-author of Chapter 2, “Historical Highlights”, co-author of Chapter 7, “Communications Applications of Vacuum Electronic Devices” in Modern Microwave and Millimeter-Wave Power Electronics, IEEE Press, NY 2004.
  3. D.M. Goebel, co-author of Chapter 4, “Pulse Shortening and Improved High Vacuum Techniques”, Chapter 8: “Cathodes and Electron Guns”, Chapter 9 “Plasma Assisted Beam Transport”, and Chapter 10: “Plasma Loading of HPM Devices, in Advances in High Power Microwave Sources and Technologies, IEEE Press, NY 2001.
  4. D.M. Goebel, author of Chapter 7, “Plasma Sources”, and co-author of Chapter 8 “Pulser Technology for Plasma-Immersion Ion Implantation and Deposition”, Handbook of Plasma Immersion Ion Implantation and Deposition, Wiley, New York (Sept. 2000).

Selected Refereed Technical Journal Publications
  1. D.M. Goebel, “Analytical Discharge Performance Model for rf Ion Thrusters”, IEEE Transactions on Plasma Science, 36, p. 2111-2121, (2008).
  2. D.M. Goebel, K. Jameson, I, Katz and I. Mikellides, “Potential Fluctuations and Energetic Ion Production in Hollow Cathode Discharges”, Physics of Plasmas, 14, 103508 (2007).
  3. D.M. Goebel, R.E. Wirz, and I. Katz, “Analytical Ion Thruster Discharge Performance Model”, Journal of Propulsion and Power, 23, No.5, p.900 (2007).
  4. D.M. Goebel, R.M. Watkins and K. Jameson, “LaB6 Hollow Cathodes for Ion and Hall Thrusters”, AIAA Journal of Propulsion and Power, 23, No.3, p.527-528 (2007).
  5. D.M. Goebel, K. Jameson, I. Katz and I. Mikellades, “Hollow Cathode Theory and Modeling: I. Plasma Characterization with Miniature Fast-Scanning Probes”, J. App. Phys., 98(10), 113302 (2005).
  6. D.M. Goebel and A. Schneider, “High Voltage Breakdown and Conditioning of Carbon and Molybdenum Electrodes”, IEEE Trans. Plasma Sci., 33, 1136–1148, (2005).
  7. D.M. Goebel, W.L. Menninger and A. Schneider, “Gain Increases Through End of Life in Traveling Wave Tubes, IEEE Trans. Electron Devices, 50, 1117-1124 (2003).
  8. D.M. Goebel, R.Liou, W. Menninger, X. Zhai, and E.A. Adler, “Development of linear TWT amplifiers for telecommunications Applications”, IEEE Transactions on Electron Devices, 48, 74-81 (2001).
  9. D.M. Goebel, “Theory of Long Term Gain Growth in Traveling Wave Tubes”, IEEE Trans. on Electron Devices, 47, 1286-1292 (2000).
  10. D.M. Goebel and R.M. Watkins, “High Current, Low Pressure Plasma Cathode Electron Gun”, Rev. Sci. Instrum., 71, 388-398 (2000).
  11. D.M. Goebel, J.G.Keller, W.L.Menninger, S.Blunk, “Gain Stability in Traveling Wave Tubes”, IEEE Transactions on Electron Devices, 46, 2235-2243 (1999).
  12. D.M. Goebel, Y.Carmel, G.Nusinovich, “Advances in Plasma Filled Microwave Sources”, Physics of Plasmas, 6, 2225-2232 (1999).
  13. D.M. Goebel, E.S.Ponti, R.W.Lemke, “Frequency and Power Response of High-Power Plasma-filled BWO Microwave Source”, Physics of Plasmas Letters, 6, 2319-2322 (1999).
  14. D.M. Goebel, E.A.Adler, E.S.Ponti, J.Feicht, R.Eisenhart, R.W.Lemke, “Efficiency Enhancement in High Power Microwave Oscillators”, IEEE Trans. Plasma Sci., 27, 800-808 (1999).
  15. D.M. Goebel, “Pulse Shortening Causes in High Power Microwave Devices”, IEEE Trans. Plasma Science, 26 263-272 (1998).
  16. D.M. Goebel, “Performance and Pulse Shortening in a 200 keV Pasotron Microwave Source”, IEEE Trans. Plasma Science, 26 354-363 (1998).
  17. D.M. Goebel, "Cold-Cathode, Pulsed-Power Plasma Discharge Switch", Rev. Sci. Instru., 67, (1996) 3136.
  18. D.M. Goebel, J.M. Butler, R.W. Schumacher, R.L. Eisenhart, "High Power Microwave Source Based on an Unmagnetized Backward Wave Oscillator, IEEE Trans. Plasma Science, 22, 547-555 (1994).
  19. D.M. Goebel, "High Power Modulator for Plasma Ion Implantation," J. Vac. Sci. Tech. B, 12, (1994) 838-842.
  20. D.M. Goebel, R.L. Poeschel, R.W. Schumacher, "Low Forward Voltage Drop Plasma Switch for Inverter and Modulator Applications," Rev. Sci. Instrum.64 (1993) 2312.
  21. D.M.Goebel, J.Bohdansky, R.W.Conn, Y.Hirooka, W.K.Leung, B. LaBombard, R.E.Nygren, G.N.Tynan, "Erosion and Plasma Redeposition of Graphite by Hydrogen Plasmas", Fusion Technology 15 (1989) 102-107.
  22. D.M.Goebel, et al., "ALT-II Toroidal Belt Pump Limiter Performance in TEXTOR," J.Nucl. Mat. 162-164 (1989) 115.
  23. D.M.Goebel, J.Bohdansky, R.W.Conn, et al., "Erosion and Redeposition of Graphite by High Density Plasma Bombardment", Nuclear Fusion 28 (1988) 1041.
  24. D.M.Goebel, G.A.Campbell, R.W.Conn, et al.,"Langmuir Probe Measurements in the TEXTOR Tokamak During ALT-I Pump Limiter Experiments," Plasma Physics and Controlled Fusion 29 (1987) 473.
  25. D.M.Goebel, Y.Hirooka, R.W.Conn, et al., "Erosion and Redeposition Experiments in the PISCES Facility," J.Nucl. Mat. 145-147 (1987) 61.
  26. D.M. Goebel, "Pump Limiter Experiments and Engineering," Fusion Technology 10 (1986) 761.
  27. D.M.Goebel, Y.Hirooka, T.A.Sketchley, "Large Area Lanthanum Hexaboride Electron Emitter," Rev. Sci. Instrum. 56 (1985) 1717.
  28. D.M.Goebel, Y.Hirooka, G.A.Campbell, "Large Area Lanthanum Molybdenum Electron Emitter," Rev. Sci. Instrum. 56 (1985) 1888.
  29. D.M.Goebel, G.A.Campbell, R.W.Conn, "Plasma Surface Interaction Facility-PISCES", J.Nucl. Mat. 121 (1984) 277.
  30. D.M.Goebel, R.W.Conn, "Observation of Enhanced Particle Removal Rates in Pump Limiter Simulation Experiments", J.Nucl.Mat. 128 (1984) 249.
  31. D.M. Goebel "Ion Source Discharge Performance and Stability", Physics of Fluids, 25 (1982) 1093.
  32. D.M. Goebel, A.T. Forrester, J.T. Crow, "Plasma Studies on a Hollow Cathode, Magnetic Multipole Ion Source", Rev. Sci. Instrum. 53 (1982) 810.
  33. D.M. Goebel, A.T. Forrester, S. Johnson, " Lanthanum Molybdenum Emitters in Hollow Cathodes", Rev. Sci. Instrum. 51 (1980) 1468.
  34. D.M. Goebel, J.T. Crow, A.T. Forrester, "Lanthanum Hexaboride Hollow Cathode for Dense Plasma Production", Rev. Sci. Instrum. 49 (1978) 469.
  35. D.M. Goebel, G.W. Hamilton, " Neutral Beam Injector for 475 keV MARS Sloshing Ions", in: Production and Neutralization of Negative Ions and Beams, American Institute of Physics Proc. 111 (1984) 617, re-published in Nuclear Engineering and Design/Fusion, 3 (1986).
  36. K. Jameson, D.M. Goebel, R. Watkins, “Hollow Cathode and Thruster Discharge Chamber Plasma Measurements Using High-Speed Scanning Probes”, submitted to the Journal of Propulsion and Power, May 2008.
  37. A. Sengupta, D.M. Goebel, A. Owens, “Langmuir Probe Studies of Magnetic Confinement in an Ion Thruster Discharge Plasma”, Journal of Propulsion and Power, Vol. 25, No. 2, March 2009.
  38. I. Mikellides, I. Katz, D. Goebel, K. Jameson, “Wear Mechanisms in Electron Sources for Ion Propulsion, II: Discharge Hollow Cathode”, AIAA Journal of Propulsion and Power, Vol. 24, No. 4, July 2007.
  39. I. Katz, I. Mikellides, D.M. Goebel and J. Polk, “Insert Heating and Ignition of Inert Gas Hollow Cathode”, IEEE Transactions on Plasma Science, 36, p. 2199-2206, (2008).
  40. I. Katz, R. Hofer and D.M. Goebel, “Ion Current Transport in Hall Thrusters”, IEEE Transactions on Plasma Science, 36, p. 2015-2024, (2008).
  41. R. Wirz, J. Anderson, I. Katz and D.M. Goebel, “Decel Grid Effects on Ion Thruster Grid Erosion”, IEEE Transactions on Plasma Science, 36, p. 2122-2129, (2008).
  42. R. Hofer, L. Johnson, D.M.Goebel and R. Wirz, “Effect of Internally-Mounted Cathodes on a Hall Thruster Plume Properties”, IEEE Transactions on Plasma Science, 36, p. 2004-2014, (2008).
  43. R.E. Wirz and D.M. Goebel, “Effects of Magnetic Field Topography on Ion Thruster Discharge Performance”, Plasma Sources and Science Technology, 17, Issue 3, (2008) 035010.
  44. R.D. Kolasinski, J.E. Polk, D. Goebel, L.K. Johnson, “Carbon Sputtering Yield Measurements at Grazing Incidence”, Applied Surface Science (2007), 10.1016/ j.apsusc.2007.09.082
  45. I. Katz, J.E. Polk, I. Mikellides, D.M. Goebel, S.E. Hornbeck, “Thermal Model of the Hollow Cathode Using Numerically Simulated Plasma Fluxes, J. Propulsion and Power, 23, No. 3, p. 8-11 (2007).
  46. R.D. Kolasinski, J.E. Polk, D.M.Goebel and L.K. Johnson, “Sputtering Yield Measurements at Glancing Incidence Using a Quartz Crystal Microbalance” J. Vac. Sci. Tech. A, 25, p.236-245 (2007).
  47. I. Mikellades, I.Katz, D.M.Goebel, K.K. Jameson “Evidence of Nonclassical Plasma Transport in Hollow Cathodes for Electric Propulsion”, J. Appl. Phys., 101, No.6, 063301 (2007).
  48. I. Mikellades, I.Katz, D.M.Goebel, K.K. Jameson “Plasma Processes Inside Orificed Hollow Cathodes”, Physics of Plasmas, 13, 063504 (2006).
  49. I. Mikellades, I.Katz, D.M.Goebel, K.K. Jameson “Hollow Cathode Theory and Modeling: II. A two-dimensional model of the emitter region”, J. App. Phys., 98(10), 113303 (2005).
  50. K.H. Finken, et al., “The Toroidal Pump Limiter ALT-II in TEXTOR”, Fusion Sci. and Tech., 47, 126-137 (2005).
  51. G.S.Nusinovich, Y.Carmel, A.G.Shkvarunets, J.Rodgers, T.M.Antonsen, V. Granatstein, Y.Bliokh, D.M.Goebel, J. Verboncouer, “The Pasotron Progress in Theory and Experiments”, IEEE IEEE Trans. Plasma Sci., 32, 845-857 (2005).
  52. G.S.Nusinovich, Y.Carmel, T.Antonsen, D.M. Goebel, “The Pasotron; Recent Progress in Theory and Experiments”, IEEE Trans. Plasma Science, 52(5), (2005) 845-857.
  53. Y. Carmel, A. Shkvarunets, G.S.Nusinovich, J. Rodgers, Y.P.Bliokh, D.M.Goebel, “Electron Beam Dynamics in Pasotron Microwave Sources”, Phys. Plasmas 10 (2003) 4865-4873.
  54. R.Doerner and D.M. Goebel, “Sputtering Yield Measurements during Low Energy Xenon Plasma Bombardment “, Journal of Appl. Phys., 93(9) (2003) 5816-5823.
  55. S. Kubasek, D. Goebel, W. Menninger and A. Schneider, “Power Combining Characteristics of Traveling Wave Tubes for Communications Applications, IEEE Trans. Electron Devices, 50 (2003) 1537-1542.

Conference Papers
Over 110 published conference papers for AIAA, APS and IEEE meetings over the past 30 years.

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